Closed Loop Vapor (CLV) Dryer
JST’s CLV Dryer is a combination of two proven technologies: vacuum and isopropyl alcohol (IPA) drying. The patented CLV drying technology is available as a standalone system or integrated into a JST Wet Bench. In the CLV Dryer, IPA vapor is remotely generated and introduced into the drying chamber where it mixes with and displaces the water. The vapor is then pulled out of the chamber and replaced with ultrapure nitrogen. The closed loop process provides low particle drying for blind holes, vias, and high aspect ratios while reducing IPA usage and emissions.
Typical Performance:
10-20 Minute Dry Cycle depending on carrier and product type
60mL average IPA consumption per drying cycle
Typical particle performance of
Low Vapor Emissions (less than 1 lb per day)
As with all JST wet benches, they are designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.
Standard Features
304L Stainless Steel shell and containment
316L Electropolished Stainless Steel process chamber
No IPA Vapor Present during Load/Unload
Sealed Vessel with Closed Loop Process
Indirect Heating of IPA to create vapor
CO2 Fire Suppression System
Designed with a programmable logic controller (PLC) in addition to an industrial color touchscreen
Modular design for quick replacements and minimal down time
Automated Lid with two hand safety control
Front, side, and rear access maintenance with lift-off panels
Recessed dry chamber design pulls chemical fumes through the exhausted dual containment plenum
Meets NEC, NFPA, and FM Codes for processing with flammable solvents (IPA)
SEMI S2 Certification
CE Marked
CLV-Dryer-(3)
Optional Features
Flexible dry chamber sizes available
Facility bulk chemical dispense of IPA
GEM/SECSII Factory Automation Interface
3rd Party Electrical Inspections
Heated N2 blow-off for reduced dry cycle time
External High Volume vacuum pump for reduced dry cycle time
Available as a standalone configuration or integrated into a JST Automated Wet Bench for dry to dry processing
CLV-Dryer-(4)
Applications for CLV Dryer
Silicon Wafer
II-VI Compound Wafer
MEMS
Glass Substrates
Optics and more
