JST Manufacturing Inc

Front Linear Automated

Designed for a Class 1 (ISO Class 3) Cleanroom, JST offers the Front Linear Automated (FLA) Wet Bench to process larger product profiles in an ultra-clean environment. This chemical wet bench allows for accurate process control, high throughput, and production flexibility by providing multiple lot processing simultaneously with a variety of processing parameters.

The FLA supports semi-automated or automated operation with a variety of integrated wafer input and output requirements.  As with all JST wet benches, they are designed for ease of maintenance activities and comes with our standard 24/7 Technical Support.

Standard Features

• Material Options:  304L Stainless Steel, 316L Stainless Steel, FM Approved PVC-C, or White Polypropylene
• Internal Stainless Steel frames isolated from process chemistry
• Designed with a programmable logic controller (PLC) in addition to an industrial PC that controls the entire wet bench
• Local data logging of all process parameters and lot tracking stored on the PC’s hard drive
• Ergonomically mounted 23” Color Touchscreen Monitor, with  JST GENII Software
• Integrated HEPA filters provides an ultraclean process environment
• Ergonomically designed front or side load/unload access for product cassettes
• Automated, Multi-tasking, or Semi-Automated operation platforms
• Robust dual rail Front Linear Transfer provides stable high speed product movement
• Front access maintenance with easy lift-off hinged doors
• Rear access maintenance area provides dual containment for reservoirs, pumps, filters, and plumbing
• Recessed bath design pulls chemical fumes through the exhausted dual containment plenum
• Compatible with any JST chemical or rinse 

Optional Features 

• GEM/SECSII Factory Automation Interface
• Automated process or transport cassette stocking
• Automated cassette to cassette wafer transfer (transport to process)
• Configurations for both manual operator loading or factory automation with FOUP or SMIF load ports
• Selectable Notch Aligner
• Pre and Post Wafer scanner with Cross Slot Detection and wafer  mismatch alarms
• CO2 Fire Suppression System
• Static eliminating de-ionizer bars provided under the HEPA filters in the wafer transfer area
• Nitrogen and DI Water Hand Spray Guns
• On-board chemical analyzer with integrated concentration control and monitoring for reduced chemical usage.
• Dry to Dry configuration using JST’s 
• SEMI S2 Certification
• CE Marking
• 3rd Party Electrical Inspections

Applications For Front Linear Automation (FLA) Wet Bench​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​

• TMAH Etching
• Aqua Regia Etching
• Silicon Wafer Etching
• Lab or fab material cleaning
• HF, DHF, BOE Oxide Etching